Performance and stability of Si:H p-i-n solar cells with i layers prepared at the thickness-dependent amorphous-to-microcrystalline phase boundary

被引:56
作者
Koval, RJ [1 ]
Koh, J
Lu, Z
Jiao, L
Collins, RW
Wronski, CR
机构
[1] Penn State Univ, Dept Elect Engn, Ctr Thin Film Devices, University Pk, PA 16802 USA
[2] Penn State Univ, Dept Phys, University Pk, PA 16802 USA
关键词
D O I
10.1063/1.124752
中图分类号
O59 [应用物理学];
学科分类号
摘要
Systematic studies have been carried out on the transition from the amorphous to the microcrystalline phase in intrinsic Si:H as a function of the accumulated film thickness and the effect of this transition on p-i-n solar cell performance [J. Koh, Y. Lee, H. Fujiwara, C. R. Wronski, and R. W. Collins, Appl. Phys. Lett. 73, 1526 (1998)]. Guided by a deposition phase diagram obtained from real-time spectroscopic ellipsometry, cell structures having i layers deposited with different H-2-dilution levels and thicknesses were investigated. For these structures, the fill factors are controlled by the bulk i layers. From the systematic changes in the fill factors, specifically their initial and degraded steady-state values and their degradation kinetics, the effects of the transition from the amorphous to the microcrystalline phase within the Si:H layers are identified, and insights are obtained into the properties of these structurally graded materials. (C) 1999 American Institute of Physics. [S0003- 6951(99)00837-2].
引用
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页码:1553 / 1555
页数:3
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