Influence of water on the dielectric behaviour of chitosan films

被引:45
作者
Nogales, A
Ezquerra, TA
Rueda, DR
Martinez, F
Retuert, J
机构
[1] CSIC,INST ESTRUCTURA MAT,E-28006 MADRID,SPAIN
[2] UNIV CHILE,FAC CIENCIAS FIS & MATEMAT,DEPT QUIM,SANTIAGO,CHILE
关键词
dielectric relaxation; water sorption; natural polymers; chitosan;
D O I
10.1007/s003960050099
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The dielectric properties of chitosan films with a degree of deacetylation of 86% have been investigated in the frequency range of 10(3)-10(6) Hz covering a broad range of temperatures from -150 to 150 degrees C. The variation of the dielectric properties with temperature has been associated with two dielectric processes: (a) a local relaxation attributed to the presence of hydrogen-bonded water appearing at low temperatures (b) a conduction process related to water molecules which becomes desorbed upon heating at T > 80 degrees C. Isothermal dielectric experiments have been performed in order to follow, in real time, the occurrence of both, the water sorption and desorption processes.
引用
收藏
页码:419 / 425
页数:7
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