A virtual slit for atom optics and nanolithography

被引：18

作者：

Chu, AP

Berggren, KK

Johnson, KS

Prentiss, MG

机构：

[1] Lyman Laboratory of Physics, Harvard University, Cambridge

来源：

QUANTUM AND SEMICLASSICAL OPTICS | 1996年 / 8卷 / 03期

关键词：

D O I：

10.1088/1355-5111/8/3/015

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We propose a simple 'virtual slit' for atoms based on the position- and velocity-dependent optical pumping of atoms into an undetected internal state. We show how this slit can be used as a nanometre scale, high-contrast tool for atom lithography as well as a subrecoil collimator for atomic beams.

引用

收藏

页码：521 / 529

页数：9

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