Plasma polymerized ferrocene films

被引：26

作者：

Enlow, Jesse O. ^{[1
]}

Jiang, Hao ^{[2
]}

Grant, John T. ^{[3
]}

Eyink, Kurt ^{[1
]}

Su, Weijie ^{[4
]}

Bunning, Timothy J. ^{[1
]}

机构：

[1] USAF, Res Lab, Mat & Mfg Directorate, WPAFB, Dayton, OH 45433 USA

[2] Mat Sci & Tech Applicat LLC, Dayton, OH 45458 USA

[3] Univ Dayton, Res Inst, Dayton, OH 45469 USA

[4] AT&T Govt Solut, Dayton, OH 45324 USA

来源：

POLYMER | 2008年 / 49卷 / 19期

关键词：

photonic thin film; ferrocene; plasma polymerization;

D O I：

10.1016/j.polymer.2008.07.013

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

This communication describes the formation of high index of refraction polymer thin films using a novel plasma polymerization deposition process. A flowing afterglow plasma reactor was modified to enable sublimation of solid samples into the gas phase for subsequent plasma polymerization. Thin films of plasma polymerized ferrocene were deposited on substrates and subsequently characterized. The refractive index as a function of processing conditions was obtained. Relatively high values of n (similar to 1.73 at 589 nm) were obtained. The chemical nature of the polymer thin films was characterized using FTIR and XPS spectroscopy. This work demonstrates that plasma polymerization is an enabling technology for the fabrication of photonic thin films that utilize solid state precursors. Published by Elsevier Ltd.

引用

页码：4042 / 4045

页数：4

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