Depth distribution of luminescent Si nanocrystals in Si implanted SiO2 films on Si

被引:53
作者
Brongersma, ML
Polman, A
Min, KS
Atwater, HA
机构
[1] FOM, Inst Atom & Mol Phys, NL-1098 SJ Amsterdam, Netherlands
[2] CALTECH, Thomas J Watson Lab Appl Phys, Pasadena, CA 91125 USA
关键词
D O I
10.1063/1.370800
中图分类号
O59 [应用物理学];
学科分类号
摘要
Depth-resolved measurements of the photoluminescence of Si implanted and annealed SiO2 films on Si have been performed to determine the depth distribution of luminescent Si nanocrystals. Si nanocrystals with diameters ranging from similar to 2 to 5 nm were formed by implantation of 35 keV Si ions into a 110-nm-thick thermally grown SiO2 film on Si(100) at a fluence of 6x10(16) Si/cm(2), followed by a thermal anneal at 1100 degrees C for 10 min. The photoluminescence spectrum is broad, peaks at lambda=790 nm, and contains contributions from both recombination of quantum confined excitons in the nanocrystals and ion-implantation-induced defects. By chemical etching through the SiO2 film in steps and analyzing the changes in the photoluminescence spectrum after each etch step, the depth from which each of the two luminescence features originate is determined. The etch rate of the oxide, as derived from Rutherford backscattering spectrometry data, varies from 1.3 nm/s in the regions of small excess Si to 0.6 nm/s at the peak of the concentration profile (15 at. % excess Si). It is found that the defect luminescence originates from an similar to 15-nm-thick near-surface region. Large nanocrystals luminescing at long wavelengths (lambda=900 nm) are mainly located in the center of the film, where the Si concentration is highest (48 at. %). This is corroborated by transmission electron microscopy that shows a high density of Si nanocrystals in the size range of 2-5 nm in the center of the film. The largest density of small luminescent nanocrystals (lambda=700 nm), not detectable by electron microscopy is found near the SiO2 surface and the SiO2/Si interface. This is attributed to either the fact that the surface and the SiO2/Si interface affect the Si nanocrystal nucleation kinetics in such a way that small nanocrystals are preferentially formed in these regions, or an optical interaction between nanocrystals of different sizes that quenches the luminescence of small nanocrystals in the center of the film. (C) 1999 American Institute of Physics. [S0021-8979(99)00714-8].
引用
收藏
页码:759 / 763
页数:5
相关论文
共 25 条
  • [1] Beadle W. E., 1985, QUICK REFERENCE MANU
  • [2] A MONTE-CARLO COMPUTER-PROGRAM FOR THE TRANSPORT OF ENERGETIC IONS IN AMORPHOUS TARGETS
    BIERSACK, JP
    HAGGMARK, LG
    [J]. NUCLEAR INSTRUMENTS & METHODS, 1980, 174 (1-2): : 257 - 269
  • [3] BRONGERSMA ML, UNPUB
  • [4] BRONGERSMA ML, 1998, MAT RES SOC S P, V186
  • [5] Porous silicon: From luminescence to LEDs
    Collins, RT
    Fauchet, PM
    Tischler, MA
    [J]. PHYSICS TODAY, 1997, 50 (01) : 24 - 31
  • [6] THEORETICAL ASPECTS OF THE LUMINESCENCE OF POROUS SILICON
    DELERUE, C
    ALLAN, G
    LANNOO, M
    [J]. PHYSICAL REVIEW B, 1993, 48 (15): : 11024 - 11036
  • [7] A THEORY OF SENSITIZED LUMINESCENCE IN SOLIDS
    DEXTER, DL
    [J]. JOURNAL OF CHEMICAL PHYSICS, 1953, 21 (05) : 836 - 850
  • [8] FORSTER T, 1960, COMP EFFECTS RAD, P301
  • [9] Effect of different preparation conditions on light emission from silicon implanted SiO2 layers
    Ghislotti, G
    Nielsen, B
    AsokaKumar, P
    Lynn, KG
    Gambhir, A
    DiMauro, LF
    Bottani, CE
    [J]. JOURNAL OF APPLIED PHYSICS, 1996, 79 (11) : 8660 - 8663
  • [10] Silicon-based visible light-emitting devices integrated into microelectronic circuits
    Hirschman, KD
    Tsybeskov, L
    Duttagupta, SP
    Fauchet, PM
    [J]. NATURE, 1996, 384 (6607) : 338 - 341