Ion charge state distributions in high current vacuum arc plasmas in a magnetic field

被引：143

作者：

Oks, EM ^{[1
]}

Anders, A ^{[1
]}

Brown, IG ^{[1
]}

Dickinson, MR ^{[1
]}

MacGill, RA ^{[1
]}

机构：

[1] STATE ACAD CONTROL SYST & RADIOELECT, TOMSK 634050, RUSSIA

来源：

IEEE TRANSACTIONS ON PLASMA SCIENCE | 1996年 / 24卷 / 03期

关键词：

D O I：

10.1109/27.533127

中图分类号：

O35 [流体力学]; O53 [等离子体物理学];

学科分类号：

070204 ; 080103 ; 080704 ;

摘要：

We have investigated the charge state distributions of metal ions produced in a high current vacuum are plasma located in a strong magnetic field, The are current was varied over the range 200 A to 4 kA and the magnetic field was from zero up to 10 kG, In general, the effect of both high are current and high magnetic field is to push the distribution to higher charge states-the mean ion charge state is increased and new high charge states are formed, These effects are explained in terms of increased power input (higher plasma temperature) and delayed freezing of the charge state distribution during the plasma expansion process.

引用

页码：1174 / 1183

页数：10

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