EUCLIDES, the European EUVL program

被引：23

作者：

Benschop, JPH ^{[1
]}

Kaiser, WM ^{[1
]}

Ockwell, DC ^{[1
]}

机构：

[1] ASML, NL-5503 LA Veldhoven, Netherlands

来源：

EMERGING LITHOGRAPHIC TECHNOLOGIES III, PTS 1 AND 2 | 1999年 / 3676卷

关键词：

D O I：

10.1117/12.351165

中图分类号：

TP3 [计算技术、计算机技术];

学科分类号：

0812 ;

摘要：

A new European research program named EUCLIDES (Extreme UV Concept Lithography Development System) has been started in August 1998. The program headed by ASM Lithography (ASML), partnered by Carl Zeiss and Oxford Instruments, is evaluating EUVL as a viable lithographic solution for resolutions of 70 nm and below. This paper gives an overview of program objectives and status, including a summary of recent highlights.

引用

页码：246 / 252

页数：3