Manufacture and characterization of nanocomposite thin films of Si-SiO2 and Ag-Si

被引：6

作者：

Chang, ITH ^{[1
]}

Niu, F ^{[1
]}

Slimovici, D ^{[1
]}

Wildig, C ^{[1
]}

Leigh, PA ^{[1
]}

Dobson, PJ ^{[1
]}

Cantor, B ^{[1
]}

机构：

[1] UNIV OXFORD,OXFORD CTR ADV MAT & COMPOSITES,OXFORD OX1 3PH,ENGLAND

来源：

METASTABLE, MECHANICALLY ALLOYED AND NANOCRYSTALLINE MATERIALS, PTS 1 AND 2 | 1996年 / 225卷

关键词：

nanocomposite; cosputtering; Si-SiO2; Ag-Si; TEM; XRD; UV-VIS;

D O I：

10.4028/www.scientific.net/MSF.225-227.175

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Co-sputtering has been used to manufacture nanocomposite thin films of Si and Ag particles embedded in amorphous SiO2 and Si matrices respectively. A combination of transmission electron microscopy(TEM), Rutherford backscattering spectrometry(RBS), energy dispersive microanalysis (EDS) and UV-VIS spectrophotometry has been used to characterize the microstructures, compositions and optical behaviour of the nanocomposite thin films. In co-sputtered nanocomposite Si-SiO2 and Ag-Si films, the Si and Ag particles are typically 4-20nm in size.

引用

页码：175 / 178

页数：4

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