Passivation of p-type dopants in 4H-SiC by hydrogen

被引:14
作者
Aradi, B
Gali, A
Deák, P
Son, NT
Janzén, E
机构
[1] Tech Univ Budapest, Dept Atom Phys, H-1111 Budapest, Hungary
[2] Linkoping Univ, Dept Phys & Measurement Technol, S-58183 Linkoping, Sweden
基金
匈牙利科学研究基金会;
关键词
SiC; passivation; aluminum; boron; hydrogen;
D O I
10.1016/S0921-4526(01)00882-1
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
Experimental investigations showed passivation of the p-type dopants B and Al in 4H-SiC by the formation of B + H and Al + H complexes. The dissociation energies of these complexes differed by 0.9 eV. Ab initio supercell calculations have been performed to investigate the interaction of H with B and Al in hexagonal 4H-SiC. The total energy, geometry and electronic structure of the possible complexes have been determined. Site dependencies have also been investigated. The most stable configurations were found with H at a bond center site next to B at the Si site, and with H at the antibonding site of a carbon atom which is first neighbor to A] at a Si site. Both the B-si + H-BC and the Al-si + H-ABc complexes turned out to be electrically inactive. The different structure of the passivated complexes explains the observed difference in their dissociation energy: the calculated difference of the binding energies of these complexes is 0.9 eV, which agrees well with the experimental finding. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:722 / 725
页数:4
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