Analytical description of the film thickness distribution obtained by the pulsed laser ablation of a monoatomic target: Application to silicon and germanium

被引:22
作者
Antoni, F
Fuchs, C
Fogarassy, E
机构
[1] Lab. PHASE (UPR du CNRS no292), 67037 Strasbourg Cedex 2
关键词
D O I
10.1016/0169-4332(95)00464-5
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
In this work, the spatial distribution of laser-generated species in vacuum from a monoatomic target is deduced from the analytical resolution of the hydrodynamic equations for a plasma expanding in the adiabatic regime. The thickness distribution of the laser deposited layers is demonstrated to be related to the initial dimensions of the plasma but independent of both the laser fluence and the atomic mass of the target element. From these calculations, we also deduced an angular distribution of the deposits as a sum of cos(n) theta. These theoretical results are experimentally supported in the specific case of the pulsed excimer laser ablation of Si and Ge monoatomic targets.
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收藏
页码:50 / 54
页数:5
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