共 21 条
[1]
Measurements of pulsed-power modulated argon plasmas in an inductively coupled plasma source
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1996, 14 (02)
:391-397
[2]
ELECTRON-CYCLOTRON RESONANCE MICROWAVE DISCHARGES FOR ETCHING AND THIN-FILM DEPOSITION
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1989, 7 (03)
:883-893
[8]
Godyak VA, 1994, PLASMA SOURCES SCI T, V3
[10]
FREE-RADICALS IN AN INDUCTIVELY-COUPLED ETCHING PLASMA
[J].
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS,
1994, 33 (4B)
:2157-2163