Phase of molecular ink in nanoscale direct deposition processes

被引:30
作者
Cho, N
Ryu, S
Kim, B
Schatz, GC
Hong, SH [1 ]
机构
[1] Seoul Natl Univ, Dept Phys, Seoul 151747, South Korea
[2] Northwestern Univ, Dept Chem, Evanston, IL 60208 USA
基金
新加坡国家研究基金会; 美国国家科学基金会;
关键词
D O I
10.1063/1.2147139
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We report the first observation of a phase transition in a nanoscale direct deposition process. This transition involves the melting of molecular ink layers in dip-pen nanolithography, and it is observed by measuring the temperature dependence of the growth rate of the deposited pattern. The results are interpreted using a diffusion equation approach in conjunction with a '' double-molecular-layer '' model of the adsorbed molecules on the atomic force microscope tip. The theory provides a qualitative explanation for the dependence of the pattern growth rate on solvent and adsorbed water as well as on temperature. (c) 2006 American Institute of Physics.
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页数:6
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