Plasma deposition of thiophene derivatives under atmospheric pressure

被引：37

作者：

Dams, Roel

Vangeneagden, Dirk

Vanderzande, Dirk

机构：

[1] Flemish Inst Technol Res, VITO, B-2400 Mol, Belgium

[2] Univ Hasselt, Div Chem, Inst Mat Res, IMO, B-3590 Diepenbeek, Belgium

来源：

CHEMICAL VAPOR DEPOSITION | 2006年 / 12卷 / 12期

关键词：

atmospheric pressure; conducting polymers; conjugated polymers; plasma; thiophenes;

D O I：

10.1002/cvde.200606483

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

Plasma deposition of conjugated polymer films under atmospheric pressure is described. Three thiophene derivatives (thiophene, 3-methylthiophene, and 3,4-ethylenedioxythiophene) are used as monomers. The plasma depositions with the various precursors are compared using analytical techniques such as X-ray photoelectron spectroscopy (XPS), Fourier transform infrared (FTIR) spectroscopy, UV-vis spectroscopy, and resistance measurements. Good results are obtained with pulsed plasma depositions of poly(3,4-ethylenedioxythiophene). Conductivities of up to 1 x 10(-2) S cm(-1) are measured.

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页码：719 / 727

页数：9

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