In-situ monitoring of chemical vapor deposition at ambient pressure by surface-enhanced Raman spectroscopy: Initial growth of tantalum(V) oxide on platinum

被引：9

作者：

Chan, HYH

Takoudis, CG

Weaver, MJ ^{[1
]}

机构：

[1] Purdue Univ, Sch Chem Engn, W Lafayette, IN 47907 USA

[2] Purdue Univ, Dept Chem, W Lafayette, IN 47907 USA

来源：

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY | 1999年 / 121卷 / 39期

关键词：

D O I：

10.1021/ja991707s

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

引用

页码：9219 / 9220

页数：2

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