A microdeposition technique for carbon nanotubes based on electron beam lithography

We describe a deposition technique for either individual or small amounts of multiwalled carbon nanotubes which is based on electron beam lithography. Carbon nanotubes are deposited from the solution phase onto a substrate through lithographically determined openings in an electron beam resist layer. The openings vary in size from a few mu m to arbitrary size. It is possible to have one or a few nanotubes in the smaller openings. Using alignment markers, the technique has been applied to deposit individual nanotubes on top of gold electrodes. (C) 1999 American Institute of Physics. [S0021-8979(99)06412-9].