Three dimensional silicon photonic crystals fabricated by two photon phase mask lithography

被引：53

作者：

Shir, D. ^{[1
]}

Nelson, E. C. ^{[1
]}

Chen, Y. C. ^{[1
]}

Brzezinski, A. ^{[1
]}

Liao, H. ^{[1
]}

Braun, P. V. ^{[1
,3
]}

Wiltzius, P. ^{[1
,3
]}

Bogart, K. H. A. ^{[2
]}

Rogers, J. A. ^{[1
,3
]}

机构：

[1] Univ Illinois, Dept Mat Sci & Engn, Urbana, IL 61801 USA

[2] Sandia Natl Labs, Albuquerque, NM 87123 USA

[3] Univ Illinois, Beckman Inst Adv Sci & Technol, Urbana, IL 61801 USA

来源：

APPLIED PHYSICS LETTERS | 2009年 / 94卷 / 01期

关键词：

elemental semiconductors; moulding; optical fabrication; optical materials; optical polymers; photolithography; photonic crystals; silicon; two-photon processes; HOLOGRAPHIC LITHOGRAPHY; NANOSTRUCTURES; TEMPLATES;

D O I：

10.1063/1.3036955

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We describe the fabrication of silicon three dimensional photonic crystals using polymer templates defined by a single step, two-photon exposure through a layer of photopolymer with relief molded on its surface. The resulting crystals exhibit high structural quality over large areas, displaying geometries consistent with calculation. Spectroscopic measurements of transmission and reflection through the silicon and polymer structures reveal excellent optical properties, approaching properties predicted by simulations that assume ideal layouts.

引用

页数：3

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