Fabrication and STEM/EELS measurements of nanometer-scale silicon tips and filaments

被引:42
作者
Reed, BW [1 ]
Chen, JM
MacDonald, NC
Silcox, J
Bertsch, GF
机构
[1] Cornell Univ, Sch Appl & Engn Phys, Ithaca, NY 14853 USA
[2] Cornell Univ, Cornell Nanofabricat Facil, Ithaca, NY 14853 USA
[3] Cornell Univ, Sch Elect Engn, Ithaca, NY 14853 USA
[4] Univ Washington, Inst Nucl Theory, Seattle, WA 98195 USA
[5] Univ Washington, Dept Phys, Seattle, WA 98195 USA
来源
PHYSICAL REVIEW B | 1999年 / 60卷 / 08期
关键词
D O I
10.1103/PhysRevB.60.5641
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We present a series of scanning transmission electron microscopy and electron energy-loss spectroscopy (EELS) measurements of nanometer-scale single-crystal silicon tips and filaments. The tips and filaments are of a type that we are currently integrating into microelectromechanical systems. The EELS measurements reveal a number of nanometer-scale effects, some of which have already been reported in the literature for other systems. These effects include apparent upward shifts in the energies, widths, and interaction cross sections of the plasmons. in addition, we report a sharp peak at 5 eV, which we are identifying as an interband transition in the silicon. We provide theoretical explanations of the characteristics of this new peak, including an explanation of its failure to appear at any but the smallest sample diameters. Finally, we extend the theory already present in the literature with a finite-element model of EELS for nonpenetrating electrons in an arbitrary geometry. [S0163-1829(99)10131-0].
引用
收藏
页码:5641 / 5652
页数:12
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