Low-threshold 840-nm laterally oxidized vertical-cavity lasers using AlInGaAs-AlGaAs strained active layers

被引:9
作者
Ko, J
Hegblom, ER
Akulova, Y
Thibeault, BJ
Coldren, LA
机构
[1] Dept. of Elec. and Comp. Engineering, University of California, Santa Barbara
关键词
molecular beam epitaxy; semiconductor lasers; oxide aperture; rapid thermal annealing; strained active layer; vertical cavity;
D O I
10.1109/68.593324
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We explore the use of a novel strained AlInGaAs-AlGaAs material system to achieve low-threshold current in oxide-apertured vertical-cavity lasers (VCL's) emitting near 850 nm, We report a low continuous-wave (CW) room-temperature threshold current of 290 mu A from top-emitting, 840-nm VCL's with a 5-mu m-wide thin-oxide aperture, The low-threshold current has been attributed to the use of strained active layers, which increase the gain and reduce the transparency current, We also studied the effects of postgrowth rapid thermal annealing (RTA) on the characteristics of AlInGaAs-AlGaAs VCL's and found that RTA improves the material quality and significantly enhances VCL performance.
引用
收藏
页码:863 / 865
页数:3
相关论文
共 18 条
[1]   METHOD FOR ACCURATE GROWTH OF VERTICAL-CAVITY SURFACE-EMITTING LASERS [J].
CHALMERS, SA ;
KILLEEN, KP .
APPLIED PHYSICS LETTERS, 1993, 62 (11) :1182-1184
[2]   RESIDUAL OXYGEN LEVELS IN ALGAAS/GAAS QUANTUM-WELL LASER STRUCTURES - EFFECTS OF SI AND BE DOPING AND SUBSTRATE MISORIENTATION [J].
CHAND, N ;
JORDAN, AS ;
CHU, SNG ;
GEVA, M .
APPLIED PHYSICS LETTERS, 1991, 59 (25) :3270-3272
[3]  
COLDREN LA, 1997, OPTICAL FIBER TELECO, V3, pCH6
[4]  
CORZINE S, 1993, SPIE 93, V1850, P177
[5]  
HEGBLOM ER, 1996, APPL PHYS LETT, V68, P13
[6]  
HEGBLOM ER, IN PRESS IEEE J SELE
[7]   Sub-40 mu A continuous-wave lasing in an oxidized vertical-cavity surface-emitting laser with dielectric mirrors [J].
Huffaker, DL ;
Graham, LA ;
Deng, H ;
Deppe, DG .
IEEE PHOTONICS TECHNOLOGY LETTERS, 1996, 8 (08) :974-976
[8]   Low threshold MBE-grown AllnGaAs/AlGaAs strained multiquantum-well lasers by rapid thermal annealing [J].
Ko, J ;
Chen, CH ;
Coldren, LA .
ELECTRONICS LETTERS, 1996, 32 (22) :2099-2100
[9]  
KO J, 1996, ELECTRON LETT, V52, P351
[10]   SELECTIVELY OXIDIZED VERTICAL-CAVITY SURFACE-EMITTING LASERS WITH 50-PERCENT POWER CONVERSION EFFICIENCY [J].
LEAR, KL ;
CHOQUETTE, KD ;
SCHNEIDER, RP ;
KILCOYNE, SP ;
GEIB, KM .
ELECTRONICS LETTERS, 1995, 31 (03) :208-209