Diffraction stress analysis of thin films: Modeling and experimental evaluation of elastic constants and grain interaction

被引:79
作者
van Leeuwen, M
Kamminga, JD
Mittemeijer, EJ
机构
[1] Delft Univ Technol, Mat Sci Lab, NL-2628 AL Delft, Netherlands
[2] Max Planck Inst Met Res, D-70174 Stuttgart, Germany
关键词
Grain interaction models - Neerfeld-Hill models - Vook-Witt models;
D O I
10.1063/1.370986
中图分类号
O59 [应用物理学];
学科分类号
摘要
Well-known grain interaction models for the description of macroscopic elastic behavior of polycrystalline specimens, as due to Voigt, Reuss, Neerfeld-Hill, and Eshelby-Kroner, may be successfully applied to bulk specimens, but are shown to be less suited for thin films. An elaboration of a proposal due to Vook and Witt for grain interaction is given. It is assumed that the strain parallel to the specimen surface is equal in all crystallites and that the stress perpendicular to the specimen surface is zero in all crystallites. It is shown that these assumptions give rise to elastic anisotropy of the specimen on the macroscopic scale. It is also shown that in this case the dependence of the measured lattice strain (in a diffraction experiment) on the squared sine of the specimen tilt angle psi (cf. the sin(2) psi method), is nonlinear, contrary to what is predicted by the bulk grain interaction models. This is the first time that nonlinear sin(2) psi plots have been calculated using an elastic grain interaction model, in the absence of crystallographic texture. Experimental verification has been achieved by x-ray diffraction strain measurements performed on a vapor deposited nickel film. The experimental results are in good accordance with the Vook-Witt [J. Appl. Phys. 7, 2169 (1965)] grain interaction model. This is the first experimental evidence of direction dependent grain interaction in thin films. (C) 1999 American Institute of Physics. [S0021-8979(99)05514-0].
引用
收藏
页码:1904 / 1914
页数:11
相关论文
共 20 条
[1]  
[Anonymous], 1992, GEN PHYS PROPERTIES
[2]  
[Anonymous], 1910, LEHRBUCH KRISTALLPHY
[3]  
BOLLENRATH F, 1967, Z METALLKD, V58, P76
[4]   EFFECT OF GAS IMPURITY AND ION-BOMBARDMENT ON STRESSES IN SPUTTER-DEPOSITED THIN-FILMS - A MOLECULAR-DYNAMICS APPROACH [J].
FANG, CC ;
JONES, F ;
PRASAD, V .
JOURNAL OF APPLIED PHYSICS, 1993, 74 (07) :4472-4482
[5]  
HENDRIKS M, 1985, THESIS TU DELFT
[6]   THE ELASTIC BEHAVIOUR OF A CRYSTALLINE AGGREGATE [J].
HILL, R .
PROCEEDINGS OF THE PHYSICAL SOCIETY OF LONDON SECTION A, 1952, 65 (389) :349-355
[7]  
HOWARD SA, 1989, REV MINERAL, V20, P217
[8]  
Ibers J.A., 1974, INT TABLES XRAY CRYS, VIV
[9]   THE ORIGIN OF STRESS IN SPUTTER-DEPOSITED TUNGSTEN FILMS FOR X-RAY MASKS [J].
ITOH, M ;
HORI, M ;
NADAHARA, S .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1991, 9 (01) :149-153
[10]  
KAMMINGA JD, UNPUB