Transparent p-type conducting indium-doped SnO2 thin films deposited by spray pyrolysis

被引:81
作者
Ji, Z [1 ]
Zhao, L [1 ]
He, ZP [1 ]
Zhou, Q [1 ]
Chen, C [1 ]
机构
[1] Zhejiang Univ, State Key Lab Silicon Mat, Hangzhou 310027, Peoples R China
基金
中国国家自然科学基金;
关键词
SnO2; spray pyrolysis; p-type doping;
D O I
10.1016/j.matlet.2005.11.057
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Tansparent p-type conducting indiurn-doped SnO2 thin films were successfully prepared by spray pyrolysis. The films were characterized by X-ray diffraction, Hall effect, and UV-Visible absorption spectra. The results showed that for films with In/Sn ratio less than 0.3, the films were rutile structure of SiO2, while for filin with In/Sn ratio of 0.4, peaks from In2O3 were observed. Hall effect measurement showed that the conducting type was dependent on both the process temperature and In/Sn ratio. For the films with In/Sn ratio=0.1 and 0.2, and process temperatures T >= 600 degrees C, the films were p-type, while for T < 600 degrees C, the films were n-type. For the films processed at the same temperature (T=700 degrees C), the films were n-type if In/Sn > 0.2, and the films were p-type when In/Sn <= 0.2. In addition, UV-Vis absorption spectra showed no shift of the absorption edge when doped by indium for In/Sn ratio < 0.4. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:1387 / 1389
页数:3
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