Differential etch rates in z-cut LiNbO3 for variable HF/HNO3 concentrations

被引:96
作者
Sones, CL
Mailis, S
Brocklesby, WS
Eason, RW [1 ]
Owen, JR
机构
[1] Univ Southampton, Optoelect Res Ctr, Southampton SO17 1BJ, Hants, England
[2] Univ Southampton, Dept Chem, Southampton SO17 1BJ, Hants, England
关键词
D O I
10.1039/b106279b
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We report the experimental measurements for etch rates of the +z and -z faces of single crystal lithium niobate immersed in HF and HNO3 acid mixtures of varying ratios. We find that pure HF produces an etch rate that is a factor of 2 higher than the rate obtained for the more frequently used mixture of HF/HNO3 in a 1 : 2 ratio. We further observe that the quality of etching is improved for either pure HF or HF/HNO3 in a 1 : 4 ratio, again by comparison with use of a 1 : 2 ratio. These results lead to a discussion of the etch chemistry involved, and an explanation for the observed high degree of differential etching between the +z and -z crystal faces.
引用
收藏
页码:295 / 298
页数:4
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