Morphology of Pd multilayers on Cu(110)

被引:20
作者
Bennett, RA
Poulston, S
Price, NJ
Reilly, JP
Barnes, CJ
Bowker, M
机构
[1] Univ Reading, Dept Chem, Reading RG6 6AD, Berks, England
[2] Dublin City Univ, Sch Chem Sci, Dublin 9, Ireland
基金
英国工程与自然科学研究理事会;
关键词
catalysis; copper; growth; low index single crystal surfaces; palladium; scanning tunnelling microscopy; surface diffusion; surface relaxation and reconstruction; surface segregation; surface structure; morphology; roughness and topography;
D O I
10.1016/S0039-6028(99)00133-8
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The growth of Pd films deposited on a Cu(110) single crystal surface and the resulting morphology of the film structure has been followed by STM for deposition at 310 K. For similar to 1 hit films an ordered (2 x 1) surface alloy is formed which is also visible in LEED. The surface morphology is, however, not flat but has roughened step edges, raised islands and smaller trenches. For increased coverages of Pd the growth shifts to the formation of rectangular multilayered Pd islands. Upon annealing, AES shows a preferential segregation of Cu to the surface region that accompanies a flattening of the surface morphology in STM. Annealing thick films (>4 ML) to 603 K produces a surface morphology with larger flat terraces and small islands that have rough, non-crystallographically aligned step edges. With further annealing to 723 K these surfaces also display large-scale 'banding' in the STM images that we attribute to stress relaxation between the CuPd alloy and Cu. (C) 1999 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:816 / 821
页数:6
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