Line-pantograph EMI in railway systems

被引：23

作者：

Tellini, B ^{[1
]}

Macucci, M

Giannetti, R

Antonacci, GA

机构：

[1] Univ Pisa, Dept Engn, I-56100 Pisa, Italy

[2] Univ Pontificia Comillas Madrid, Madrid, Spain

来源：

IEEE INSTRUMENTATION & MEASUREMENT MAGAZINE | 2001年 / 4卷 / 04期

关键词：

D O I：

10.1109/5289.975459

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The electromagnetic emissions from the interaction between the pantograph and the overhead contact line were studied. For this purpose, a model was established to predict the contributions from the pantograph contact to electromagnetic emissions in new designs. Preliminary results indicate that significant electromagnetic emissions, 100 V/m or more at a distance of 1-2 m, are evident only in the case of a switch-on transient and for an extremely short time.

引用

页码：10 / 13

页数：4

共 6 条

[1]

*CENELEC, 1996, 50121 CENELEC

[2] Remarks on models for prediction of radiated fields in electrical discharge events [J].

Giannetti, R ;

Macucci, M ;

Tellini, B .

ELECTRONICS LETTERS, 2001, 37 (13) :817-819

[3]

Leva S, 2000, IEICE T COMMUN, VE83B, P519

[4] FIELDS RADIATED BY ELECTROSTATIC DISCHARGES - COMMENT [J].

MARDIGUIAN, M .

IEEE TRANSACTIONS ON ELECTROMAGNETIC COMPATIBILITY, 1992, 34 (01) :62-62

[5]

Tellini B, 1998, IEEE IMTC P, P749, DOI 10.1109/IMTC.1998.676825

[6] Conducted and radiated interference measurements in the line-pantograph system [J].

Tellini, B ;

Macucci, M ;

Giannetti, R ;

Antonacci, GA .

IMTC/2000: PROCEEDINGS OF THE 17TH IEEE INSTRUMENTATION AND MEASUREMENT TECHNOLOGY CONFERENCE: SMART CONNECTIVITY: INTEGRATING MEASUREMENT AND CONTROL, 2000, :457-460

← 1 →