Observation of single interface traps in submicron MOSFET's by charge pumping

被引:40
作者
Groeseneken, GV
DeWolf, I
Bellens, R
Maes, HE
机构
[1] Interuniv. Micro-tlectronics Center
关键词
D O I
10.1109/16.502127
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The observation of single interface traps in small area MOSFET's by charge pumping is demonstrated for the first time. The dependence of the single trap charge pumping current on the base level voltage is described. Also the creation of one single interface trap under influence of low level hot carrier injection is demonstrated. A prediction of the charge pumping current behavior as a function of rise and fall time and temperature for the case of individual traps is made, The correlation with RTS-noise experiments is discussed.
引用
收藏
页码:940 / 945
页数:6
相关论文
共 15 条
[1]  
CHRISTOLOVEANU S, 1993, P ESSDERC C, P797
[2]   A RELIABLE APPROACH TO CHARGE-PUMPING MEASUREMENTS IN MOS-TRANSISTORS [J].
GROESENEKEN, G ;
MAES, HE ;
BELTRAN, N ;
DEKEERSMAECKER, RF .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1984, 31 (01) :42-53
[3]  
GROESENEKEN G, 1994, P ESSDERC C, P609
[4]   ELECTRON-HOLE RECOMBINATION IN GERMANIUM [J].
HALL, RN .
PHYSICAL REVIEW, 1952, 87 (02) :387-387
[5]   ANALYSIS OF THE CHARGE PUMPING TECHNIQUE AND ITS APPLICATION FOR THE EVALUATION OF MOSFET DEGRADATION [J].
HEREMANS, P ;
WITTERS, J ;
GROESENEKEN, G ;
MAES, HE .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1989, 36 (07) :1318-1335
[6]  
SAKS NS, 1996, IN PRESS APPL PHYS L
[7]   COULOMB ENERGY OF TRAPS IN SEMICONDUCTOR SPACE-CHARGE REGIONS [J].
SCHULZ, M .
JOURNAL OF APPLIED PHYSICS, 1993, 74 (04) :2649-2657
[8]   MINIMOS - A TWO-DIMENSIONAL MOS-TRANSISTOR ANALYZER [J].
SELBERHERR, S ;
SCHUTZ, A ;
POTZL, HW .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1980, 27 (08) :1540-1550
[9]   STATISTICS OF THE RECOMBINATIONS OF HOLES AND ELECTRONS [J].
SHOCKLEY, W ;
READ, WT .
PHYSICAL REVIEW, 1952, 87 (05) :835-842
[10]  
SIMMONS JG, 1973, SOLID STATE ELECTRON, V16, P43, DOI 10.1016/0038-1101(73)90124-X