Mining for high Tc ferromagnetism in ion-implanted dilute magnetic semiconductors

被引:65
作者
Hebard, AF
Rairigh, RP
Kelly, JG
Pearton, SJ
Abernathy, CR
Chu, SNG
Wilson, RG
机构
[1] Univ Florida, Dept Phys, Gainesville, FL 32611 USA
[2] Univ Florida, Dept Mat Sci & Engn, Gainesville, FL 32611 USA
[3] Lucent Technol, Bell Labs, Murray Hill, NJ 07974 USA
[4] Stevenson Ranch, San Jose, CA 95131 USA
关键词
D O I
10.1088/0022-3727/37/4/001
中图分类号
O59 [应用物理学];
学科分类号
摘要
Ion implantation is a valuable tool for introducing transition metal Ions Such as Cr, Mn, Fe, Co and Ni into a variety of semiconductors Including AlN, GaN, GaP and SIC. High-transition-temperature ferromagnetic behaviour is found to be the rule rather than the exception. Implantation combined with magnetic screening techniques to determine hysteretic transition temperatures provides an effective procedure for rapidly determining whether particular combinations of magnetic dopants and host semiconductors are likely to display high-temperature ferromagnetic properties. Recent results on Cr, Mn and Co implanted into wide-bandgap AlN are presented and discussed with respect to their promise as carrier-mediated ferromagnets that might be useful For spintronics applications.
引用
收藏
页码:511 / 517
页数:7
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