S-N-S weaklink junctions fabricated by nanometer lithography

被引：4

作者：

Hirose, N ^{[1
]}

Ohta, H ^{[1
]}

Matsui, T ^{[1
]}

Fukuda, M ^{[1
]}

机构：

[1] TAKUSHOKU UNIV,FAC ENGN,TOKYO 193,JAPAN

来源：

IEEE TRANSACTIONS ON APPLIED SUPERCONDUCTIVITY | 1997年 / 7卷 / 02期

关键词：

D O I：

10.1109/77.621780

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

It is well known that the dimensions of the weak-link is the most important factor of its characteristics. However, the relationship between the dimensions and the characteristics of the weak-links are not clarified, because the geometrical dimensions are usually different from the effective dimensions, To clarify this relationship, we fabricated S-N-S (niobium as the superconductor and gold as the normal metal) weak-link junctions using electron beam lithography (EBL), reactive ion etching (RIE) and lift-off, The dimensions of the weak-links were controllable and the minimum width and length were 30 nm and 40 nm, respectively.

引用

页码：2635 / 2637

页数：3

共 8 条

[1]

ANDREEV AF, 1964, SOV PHYS JETP-USSR, V19, P1228

[2] SUPERCONDUCTING TUNNELING WITHOUT THE TUNNELING HAMILTONIAN [J].