Quantification of low levels of fluorine content in thin films

被引：11

作者：

Ferrer, F. J. ^{[1
]}

Gil-Rostra, J. ^{[2
]}

Terriza, A. ^{[2
]}

Rey, G. ^{[3
]}

Jimenez, C. ^{[3
]}

Garcia-Lopez, J. ^{[1
]}

Yubero, F. ^{[2
]}

机构：

[1] Univ Seville, CSIC, Ctr Nacl Aceleradores, Av Thomas A Edison 7, E-41092 Seville, Spain

[2] Univ Seville, CSIC, Inst Ciencia Mat, E-41092 Seville, Spain

[3] INPGrenoble Minatec 3, Lab Mat & Genie Phys, UMR 5628, F-38016 Grenoble 1, France

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 2012年 / 274卷

关键词：

Fluorine content; Rutherford Backscattering Spectrometry; Particle induced gamma-ray emission; Fluorine-doped tin oxides; Fluorinated silica films; Fluorinated carbon films; CHEMICAL-VAPOR-DEPOSITION; SCATTERING CROSS-SECTION; SIOF FILMS; NUCLEAR-REACTIONS; CARBON; TRANSPARENT; TEMPERATURE;

D O I：

10.1016/j.nimb.2011.11.042

中图分类号：

TH7 [仪器、仪表];

学科分类号：

080401 [精密仪器及机械];

摘要：

Fluorine quantification in thin film samples containing different amounts of fluorine atoms was accomplished by combining proton-Rutherford Backscattering Spectrometry (p-RBS) and proton induced gamma-ray emission (PIGE) using proton beams of 1550 and 2330 keV for p-RBS and PIGE measurements, respectively. The capabilities of the proposed quantification method are illustrated with examples of the analysis of a series of samples of fluorine-doped tin oxides, fluorinated silica, and fluorinated diamond-like carbon films. It is shown that this procedure allows the quantification of F contents as low as 1 at.% in thin films with thicknesses in the 100-400 nm range. (C) 2011 Elsevier B.V. All rights reserved.

引用

页码：65 / 69

页数：5

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