Electron emission characterization of diamond thin films grown from a solid carbon source

Diamond films of various morphologies and compositions have been deposited on silicon substrates by a plasma-enhanced chemical transport (PECT) process from a solid carbon source. Electron emission efficiency of these diamond films is related to their morphology and composition. The electric field required to excite emission in a boron-doped polycrystalline diamond film ranged between 20 to 50 MV m(-1) In an undoped conducting nanocrystalline diamond composite film, the field was as low as 5-11 MV m(-1). The cold field electron emission of these films is confirmed from the Fowler-Nordheim plots of the data. Enhancement of electron emission by band-bending and by the nanocrystalline microstructure are discussed. New diamond emitters made of nanocrystalline boron-doped diamond composite are proposed.