A SiC thin film grown by propane carbonization of a Si(lll) substrate has been characterized by transmission electron microscopy and scanning electron microscopy techniques. This study reveals the presence of planar defects in the SiC layer and voids in the Si(111) substrate as well as misfit dislocations at the SiC/Si interface. The resulting SiC layer consists of a mosaic structure and is shown to have low stress. (C) 1999 Elsevier Science S.A. All rights reserved.