True two-phase CCD image sensors employing a transparent gate

被引:5
作者
Des Jardin, W [1 ]
Kosman, S [1 ]
机构
[1] Eastman Kodak Co, Rochester, NY 14650 USA
来源
SENSORS, CAMERAS, AND SYSTEMS FOR SCIENTIFIC/INDUSTRIAL APPLICATIONS | 1999年 / 3649卷
关键词
charge coupled device; CCD; image sensor; transparent;
D O I
10.1117/12.347063
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
This paper describes the performance of a family of full-frame sensor designs where a transparent electrode replaces one of the polysilicon gates. The sensors are all fabricated with a true two-phase buried channel CCD process that is optimized for operation in multi-pinned phase (MPP) mode for low dark current. The true two-phase architecture provides many advantages such as progressive scan, square pixels, high charge capacity, and simplified drive requirements. The uncomplicated structure allows large area arrays to be fabricated with reasonable yield. Inclusion of a transparent gate increases the response by a factor of 10 at 400 nm and 50% at 600 nm.
引用
收藏
页码:74 / 79
页数:6
相关论文
共 5 条
[1]  
HYNACEK J, 1981, IEEE T ELECTRON DEV, V28, P483
[2]  
JANESICK JR, SPIE SHORT COURSE, V2
[3]  
STEVENS EG, 1987, ISSCC DIGEST TECHNIC, P114
[4]  
STEVENS EG, 1991, SPIE P, V1147, P274
[5]   A FRAME-TRANSFER CCD COLOR IMAGER WITH VERTICAL ANTIBLOOMING [J].
VANDESTEEG, MJH ;
PEEK, HL ;
BAKKER, JGC ;
PALS, JA ;
DILLEN, BGMH ;
OPPERS, JAMAM .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1985, 32 (08) :1430-1438