Fabrication of microprisms for planar optical interconnections by use of analog gray-scale lithography with high-energy-beam-sensitive glass

被引：46

作者：

Gimkiewicz, C

Hagedorn, D

Jahns, J

Kley, EB

Thoma, F

机构：

[1] Fern Univ Hagen, Opt Nachrichtentech, D-58084 Hagen, Germany

[2] Univ Jena, Inst Angew Phys, D-07743 Jena, Germany

来源：

APPLIED OPTICS | 1999年 / 38卷 / 14期

关键词：

D O I：

10.1364/AO.38.002986

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

For an integrated free-space optical interconnection system we suggest the use of microprisms to achieve large coupling angles at low loss. Prisms were fabricated in photoresist and quartz glass by analog lithography. High-energy-beam-sensitive glass was used as the gray-tone mask. Optical testing of the prisms shows acceptable surface quality and high efficiency (95%). (C) 1999 Optical Society of America.

引用

页码：2986 / 2990

页数：5

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