Development of RTP for industrial solar cell processing

被引：8

作者：

Horzel, J

Allebe, C

Szlufcik, J

Sivoththaman, S

机构：

[1] IMEC VZW, B-3001 Louvain, Belgium

[2] Univ Waterloo, Dept Elect & Comp Engn, Waterloo, ON N2L 3G1, Canada

来源：

SOLAR ENERGY MATERIALS AND SOLAR CELLS | 2002年 / 72卷 / 1-4期

关键词：

RTP; c-Si; screen-printing; industrial processing; selective emitter; UV enhancement;

D O I：

10.1016/S0927-0248(01)00173-8

中图分类号：

TE [石油、天然气工业]; TK [能源与动力工程];

学科分类号：

0807 ; 0820 ;

摘要：

Rapid Thermal Processing (RTP), originally developed for processing microelectronic devices has been investigated in the recent decade for its potential in the production of Si solar cells. This paper will discuss the use of RTP for industrial Si solar cells with screen-printed contacts. Printed metal contacts require adapted emitters when good fill factors should be achieved. Multi-crystalline Si substrates require to adapt the temperature ramps of RTP to avoid minority carrier lifetime degradation from activated defect centres. Finally, industrial processing requires high throughput that cannot be achieved with conventional RTP equipment. This paper will present an advanced selective emitter process and a recently developed continuous RTP system that meet for the first time the requirements to make RTP compatible with industrial solar cell processing. The limits of industrial RTP solar cell processing will be discussed. (C) 2002 Elsevier Science B.V. All rights reserved.

引用

页码：263 / 269

页数：7

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