Advanced process control: Benefits for photolithography process control

被引：5

作者：

Gould, C ^{[1
]}

机构：

[1] Infineon Technol Richmond, Sandston, VA 23150 USA

来源：

2002 IEEE/SEMI ADVANCED SEMICONDUCTOR MANUFACTURING CONFERENCE AND WORKSHOP: ADVANCING THE SCIENCE OF SEMICONDUCTOR MANUFACTURING EXCELLENCE | 2002年

关键词：

D O I：

10.1109/ASMC.2002.1001582

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

High volume, cost effective, manufacturing of state of the art(1) lithography processes requires in depth understanding of Process and Process-Tool interaction to achieve Advanced Process Control (APC). The APC systems being deployed at Infineon Technologies, Richmond has shown and is expected to continue demonstrating continuous improvement for the following primary metrics: OL &CD Cpk Rework Reduction Reduction of MTTD Lot Cycle Time improvement.

引用

页码：98 / 100

页数：3