A synchrotron study of the deposition of vanadia on TiO2(110)

被引:54
作者
Biener, J
Bäumer, M
Madix, RJ [1 ]
机构
[1] Stanford Univ, Dept Chem Engn, Stanford, CA 94305 USA
[2] Stanford Univ, Dept Chem, Stanford, CA 94305 USA
[3] Max Planck Gesell, Fritz Haber Inst, D-14195 Berlin, Germany
基金
美国国家科学基金会;
关键词
Auger electron spectroscopy; clusters; growth; near edge extended X-ray absorption fine structure (NEXAFS); single crystal surfaces; synchrotron radiation; titanium oxide; vanadium oxide;
D O I
10.1016/S0039-6028(99)00399-4
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The electronic structure of vanadia supported on TiO2(110) was investigated by means of low energy electron diffraction, Auger electron spectroscopy, X-ray photoelectron spectroscopy, work-function and near edge X-ray absorption fine structure spectroscopy (NEXAFS) measurements. Vanadia films in the submonolayer-to-multilayer coverage regime were deposited at 300 K by evaporation of metallic vanadium in an oxygen ambient. The vanadia films appear to grow in a two-dimensional fashion, without any long-range order, probably via a simultaneously multilayer growth mode. The photoemission data suggest the formation of a vanadium oxide with partially filled d-orbitals. The position and the line-shape of the vanadium L- and oxygen K-edges determined by NEXAFS indicate V2O3 formation; the titaniuim L-edge indicates only a weak electronic interaction of V2O3 with the surface of TiO2. V2O3 on TiO2 is stable up to a temperature of 1100 K, above this temperature the data indicate the formation of a ternary oxide at the interface and the simultaneous agglomeration of V2O3. (C) 1999 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:178 / 188
页数:11
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