Electron drift and attachment in CHF3 and its mixtures with argon

被引：19

作者：

Wang, YC ^{[1
]}

Christophorou, LG ^{[1
]}

Olthoff, JK ^{[1
]}

Verbrugge, JK ^{[1
]}

机构：

[1] NIST, Div Elect, Elect & Elect Engn Lab, Gaithersburg, MD 20899 USA

来源：

CHEMICAL PHYSICS LETTERS | 1999年 / 304卷 / 5-6期

关键词：

D O I：

10.1016/S0009-2614(99)00338-3

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Measurements are reported of the electron drift velocity, w, in CHF3 gas and in its mixtures with argon. The E/N dependence of w in the mixtures exhibits regions of distinct negative differential conductivity. A small electron attachment rate constant (similar to 13 X 10(-14) cm(3) s(-1) for density-reduced electric fields, E/N < 50 X 10(-17) V cm(2)) has been measured, which may be due to impurities. (C) 1999 Elsevier Science B.V. All rights reserved.

引用

页码：303 / 308

页数：6

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