Electrodeposition of Al-Ni intermetallic compounds from aluminum chloride-N-(n-butyl)pyridinium chloride room temperature molten salt

被引:44
作者
Ali, MR [1 ]
Nishikata, A [1 ]
Tsuru, T [1 ]
机构
[1] Tokyo Inst Technol, Dept Met & Ceram Sci, Meguro Ku, Tokyo 152, Japan
来源
JOURNAL OF ELECTROANALYTICAL CHEMISTRY | 2001年 / 513卷 / 02期
关键词
electrodeposition; Al-Ni alloys; intermetallic compounds; molten salt; aluminum(III) chloride-N-(n-butyl)pyridinium chloride; pulse plating; polarization curve; tafel slope;
D O I
10.1016/S0022-0728(01)00607-6
中图分类号
O65 [分析化学];
学科分类号
070302 ; 081704 ;
摘要
Electrodeposition of aluminum-nickel intermetallic compounds (particularly Ni3Al) has been carried out onto platinum and mild steel cathodes from a 2:1 (mole ratio) aluminum(III) chloride-N-(n-butyl)pyridinium chloride (BPC) molten bath saturated with nickel(II) chloride at room temperature. A single phase of Al-Ni alloy is difficult to obtain by controlled-potential and controlled-current methods; however, it can be obtained by pulse current plating. The electrodeposition of nickel from an AlCl3-BPC-NiCl2 (6.14:3.07:0.09 mole ratio) molten bath occurs via an instantaneous nucleation mechanism in the very initial stage of the crystal growth. The deposition reaction mechanisms of nickel in this molten bath are revealed by electrochemical analysis. The experimental Tafel slope of 42 mV dec(-1) and the calculated transfer coefficient (<(<alpha>)over bar>(c))of 1.5 suggest that the rate determining step is a charge transfer reaction of an adsorbed bare monovalent cation to the metallic state. The effect of the cycle regime on the electrodeposition of Al-Ni alloys has been investigated. The current efficiency for the deposition of alloys is about 99%. (C) 2001 Elsevier Science BN. All rights reserved.
引用
收藏
页码:111 / 118
页数:8
相关论文
共 17 条
[1]   Electrodeposition of Co-Al alloys of different composition from the AlCl3-BPC-CoCl2 room temperature molten salt [J].
Ali, MR ;
Nishikata, A ;
Tsuru, T .
ELECTROCHIMICA ACTA, 1997, 42 (12) :1819-1828
[2]   Electrodeposition of aluminum-chromium alloys from AlCl3-BPC melt and its corrosion and high temperature oxidation behaviors [J].
Ali, MR ;
Nishikata, A ;
Tsuru, T .
ELECTROCHIMICA ACTA, 1997, 42 (15) :2347-2354
[3]  
Ali MR, 1999, INDIAN J CHEM TECHN, V6, P317
[4]   THE ELECTRO-CRYSTALLIZATION OF NICKEL ON VITREOUS CARBON - A KINETIC AND STRUCTURAL STUDY OF NUCLEATION AND COALESCENCE [J].
AMBLARD, J ;
FROMENT, M ;
MAURIN, G ;
MERCIER, D ;
TREVISANPIKACZ, E .
JOURNAL OF ELECTROANALYTICAL CHEMISTRY, 1982, 134 (02) :345-352
[5]  
Bockris J. OM., 1973, Modern Electrochemistry, V2, P991
[6]   THE RESPONSE OF SOME NUCLEATION GROWTH-PROCESSES TO TRIANGULAR SCANS OF POTENTIAL [J].
FLETCHER, S ;
HALLIDAY, CS ;
GATES, D ;
WESTCOTT, M ;
LWIN, T ;
NELSON, G .
JOURNAL OF ELECTROANALYTICAL CHEMISTRY, 1983, 159 (02) :267-285
[7]   RAMAN-SPECTRA OF MOLTEN ALUMINUM-CHLORIDE - 1-BUTYLPYRIDINIUM CHLORIDE SYSTEMS AT AMBIENT-TEMPERATURES [J].
GALE, RJ ;
GILBERT, B ;
OSTERYOUNG, RA .
INORGANIC CHEMISTRY, 1978, 17 (10) :2728-2729
[8]   POTENTIOMETRIC INVESTIGATION OF DIALUMINUM HEPTACHLORIDE FORMATION IN ALUMINUM CHLORIDE 1-BUTYLPYRIDINIUM CHLORIDE MIXTURES [J].
GALE, RJ ;
OSTERYOUNG, RA .
INORGANIC CHEMISTRY, 1979, 18 (06) :1603-1605
[9]   ELECTROCHEMICAL AND SPECTRAL INVESTIGATIONS OF NICKEL(II) ION EQUILIBRIA IN ROOM-TEMPERATURE CHLOROALUMINATE SOLVENTS [J].
GALE, RJ ;
GILBERT, B ;
OSTERYOUNG, RA .
INORGANIC CHEMISTRY, 1979, 18 (10) :2723-2725
[10]  
HARRISON JA, 1963, ADV ELECTROCHEMISTRY, V3, P123