Chemistry and kinetics of chemical vapor deposition of pyrolytic carbon from methane

被引：26

作者：

Becker, A ^{[1
]}

Hu, Z ^{[1
]}

Huettinger, KJ ^{[1
]}

机构：

[1] Univ Karlsruhe, Inst Chem Techn, D-76128 Karlsruhe, Germany

来源：

JOURNAL DE PHYSIQUE IV | 1999年 / 9卷 / P8期

关键词：

D O I：

10.1051/jp4:1999805

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

The paper summarizes Various recent results on chemical vapor deposition of carbon from methane in the low temperature regime around 1100 degrees C. The following topics are discussed: gas phase reactions, surface/deposition reactions, interactions of gas phase and surface/deposition reactions, hydrogen inhibition, influence of temperature. Based on the results a simplified reaction scheme is presented which was successfully used to simulate the influence of temperature on carbon deposition. This; simulation as well as the influence of the substrate surface area/reactor volume-ratio (3rd parameter of CVD) are treated in other papers of the conference.

引用

页码：41 / 47

页数：7

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