Microwave plasma jet for material processing at 2.45 GHz

被引:19
作者
Al-Shamma'a, AI [1 ]
Wylie, SR [1 ]
Lucas, J [1 ]
Stuart, RA [1 ]
机构
[1] Univ Liverpool, Dept Elect Engn & Elect, Liverpool L69 3GJ, Merseyside, England
关键词
microwave plasma; laser; waveguide; material cutting; ceramic processing; vitrification;
D O I
10.1016/S0924-0136(01)01231-6
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
A microwave plasma jet (MPJ) has been used for material processing applications including cutting, welding and glass vitrification. The plasma is formed by the interaction of the high electrical field, generated by the microwave power, between the waveguide aperture and the gas nozzle. A variety of gases have been used to produce the plasma including argon, helium and nitrogen. A 6 M, 2.45 GHz MPJ, constructed using a rectangular waveguide WG9A (WR340), has been investigated. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:143 / 147
页数:5
相关论文
共 4 条
[1]  
GANDHI OP, 1986, MICROWAVE ENG APPL
[2]  
LUCAS J, 1997, Patent No. 96008958
[3]  
Steen W.M., 1998, LASER MAT PROCESSING, V2nd
[4]  
WYLIE S, 1998, P 8 INT C COMP TECHN