Stress-induced anisotropic diffusion in alloys: Complex Si solute flow near a dislocation core in Ni

被引:45
作者
Garnier, Thomas [1 ,2 ]
Manga, Venkateswara R. [1 ,3 ]
Trinkle, Dallas R. [1 ]
Nastar, Maylise [2 ]
Bellon, Pascal [1 ]
机构
[1] Univ Illinois, Dept Mat Sci & Engn, Urbana, IL 61801 USA
[2] CEA, DEN, Serv Rech Met Phys, F-91191 Gif Sur Yvette, France
[3] Univ Arizona, Tucson, AZ 85721 USA
来源
PHYSICAL REVIEW B | 2013年 / 88卷 / 13期
关键词
ALPHA-IRON; PSEUDOPOTENTIALS; PRECIPITATION; CRYSTALS; KINETICS; SOLIDS; METALS; STATE;
D O I
10.1103/PhysRevB.88.134108
中图分类号
T [工业技术];
学科分类号
120111 [工业工程];
摘要
Stress introduces anisotropy in the transport coefficients in materials, affecting diffusion. Using first-principles quantum-mechanical methods for activation barriers of atomic jumps, combined with the extended self-consistent mean-field theory to compute transport coefficients with strain-reduced symmetry, we predict significant stress-induced anisotropy for Si impurity diffusion in nickel. This causes complex spatial-and temperature-dependent fluxes; as an example, the heterogenous strain field of a dislocation creates unusual flow patterns that affect mechanical and segregation behavior.
引用
收藏
页数:6
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