Epitaxial growth of CrO2 thin films on TiO2(110) surfaces

被引：43

作者：

Bullen, HA

Garrett, SJ ^{[1
]}

机构：

[1] Michigan State Univ, Dept Chem, E Lansing, MI 48824 USA

[2] Michigan State Univ, Ctr Fundamental Mat Res, E Lansing, MI 48824 USA

来源：

CHEMISTRY OF MATERIALS | 2002年 / 14卷 / 01期

关键词：

D O I：

10.1021/cm0105256

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Chromium dioxide films on TiO2(110) single crystals have been grown by using chemical vapor deposition. The average growth rate was similar to1.8 nm.min(-1). Powder X-ray diffraction indicated that the films were highly (110) textured. X-ray photoelectron spectroscopy showed that the CrO2 films were continuous and no other chromium oxides were present. The CrO2 films were composed of grains typically 200-300 nm in diameter and appeared consistent with the rutile crystal structure. Atomic force microscopy suggested that the films were relatively rough, with a root-mean-square roughness of similar to114 nm for an 850 nm thick film. The resistivity at room temperature was found to be similar to137 muOmega(.)cm which decreased to similar to16 muOmega(.)cm at 5 K, consistent with metallic behavior. The films were ferromagnetic with a Curie temperature of 398 K.

引用

页码：243 / 248

页数：6

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