Long-term follow-up of osseointegrated titanium implants using clinical, radiographic and microbiological parameters

被引:181
作者
Leonhardt, Å
Gröndahl, K
Bergström, C
Lekholm, U
机构
[1] Molndal Cty Hosp, Specialist Dent Clin, Dept Periodontol, SE-43180 Molndal, Sweden
[2] Univ Gothenburg, Fac Odontol, Dept Oral & Maxillofacial Radiol, Gothenburg, Sweden
[3] Univ Gothenburg, Fac Odontol, Publ Dent Hlth Serv, Branemark Clin, Gothenburg, Sweden
关键词
oral implants; long-term follow-up; microbiology; radiology; clinical study;
D O I
10.1034/j.1600-0501.2002.130202.x
中图分类号
R78 [口腔科学];
学科分类号
1003 ;
摘要
The aim of this study was to longitudinally follow up osseointegrated titanium implants in partially dentate patients by clinical, radiographic and microbiological parameters in order to evaluate possible changes in the peri-implant health over time. Fifteen individuals treated with titanium implants, ad modum Branemark, and followed for ten years were included in the study. Before implant placement ten years previously, the individuals had been treated for advanced periodontal disease and thereafter been included in a maintenance care program. The survival rate of the implants after ten years was 94.7%. The bone loss was 1.7 mm when using the abutment-fixture junction as a reference point. Of the individuals, 50% were positive for plaque at the implants. Bleeding on sulcus probing was present at 61% of the implant surfaces. Ten years previously, the individuals had been carriers of putative periodontal pathogens, such as Porphyromonas gingivalis, Prevotella intermedia, Actinobacillus actinomycetemcomitans, Capnocytophaga spp. and Campylobacter rectus, and were also carriers of these species at the current examination. The results of the present study suggest that the presence of these putative periodontal pathogens at implants may not be associated with an impaired implant treatment. These species are most likely part of the normal resident microbiota of most individuals and may therefore be found at random at both stable and progressing peri-implant sites.
引用
收藏
页码:127 / 132
页数:6
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