Photodegradation of acrylic resins used in the conservation of stone

被引:154
作者
Melo, MJ
Bracci, S
Camaiti, M
Chiantore, O
Piacenti, F
机构
[1] CNR, CS Cause Dept & Metodi Conservaz Opere Arte, I-50121 Florence, Italy
[2] Univ Nova Lisboa, Fac Ciencias & Tecnol, Dept Quim, P-2825 Monte De Caparica, Portugal
[3] Univ Turin, Dipartimento Chim Inorgan Chim Fis & Chim Mat, I-10125 Turin, Italy
关键词
D O I
10.1016/S0141-3910(99)00048-8
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
The photodegradative behaviour of a series of films of acrylic resins, under controlled conditions (RH = 50% and T = 25 degrees C) has been studied. Films of acrylic resins were applied both on a dolomitic white marble support and on potassium bromide disks. The chemical evolution of the system has been followed by means of FT-IR spectra, HPLC-SEC, colour and water absorption measurements. The main degradation pathway under ultraviolet irradiation is chain scission. The observed rates of photodegradation of the different resins may be related to the type of the ester group and to the presence of the alpha-methyl group in the main chain. (C) 1999 Elsevier Science Ltd. All rights reserved.
引用
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页码:23 / 30
页数:8
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