Efficient generation of surface plasmon by single-nanoslit illumination under highly oblique incidence

被引：71

作者：

Wang, B. ^{[1
]}

Aigouy, L. ^{[3
]}

Bourhis, E. ^{[2
]}

Gierak, J. ^{[2
]}

Hugonin, J. P. ^{[1
]}

Lalanne, P. ^{[1
]}

机构：

[1] Univ Paris Sud, Inst Opt, Lab Charles Fabry, CNRS,RD 128, F-91127 Palaiseau, France

[2] CNRS, UPR 20, Lab Photon & Nanostruct, F-91460 Marcoussis, France

[3] Ecole Super Phys & Chim Ind Ville Paris, UPR 5, CNRS, Lab Photons & Mat, F-75231 Paris 5, France

来源：

APPLIED PHYSICS LETTERS | 2009年 / 94卷 / 01期

关键词：

metallic thin films; near-field scanning optical microscopy; polaritons; surface plasmons; OBJECTS; OPTICS;

D O I：

10.1063/1.3068747

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Using scanning near-field optical microscopy, we investigate the ability of nanoslits in metallic films to launch surface plasmon polaritons (SPPs) under highly oblique incidence at lambda=975 nm. The SPP generation efficiency is inferred by fitting the recorded near-field data with a simple analytical model. We find a remarkably large efficiency of 20% for the front side of the slit, which is in agreement with recent theoretical predictions relying on a fully vectoral electromagnetic formalism. An even larger efficiency is predicted experimentally (44%) and theoretically (33%) for the rear side. The present near-field analysis provides a direct approach to measure SPP generation efficiencies and may find applications for characterizing SPP devices.

引用

页数：3

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