ITO/PVK/Alq/metal LEDs:: influence of PVK doping with DCM and of passivation with sputtered Si3N4

被引:4
作者
Berthelot, L [1 ]
Tardy, J [1 ]
Garrigues, M [1 ]
Cremillieu, P [1 ]
Joseph, J [1 ]
Masenelli, B [1 ]
机构
[1] Ecole Cent Lyon, CNRS, UMR 5512, LEAME,Lab Elect, F-69131 Ecully, France
关键词
D O I
10.1016/S0925-3467(99)00052-X
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
This paper reports on the fabrication and on the characterization of LEDs consisting of two layers: a spinned-on hole transport layer, PVK layer and an evaporated tris(8-hydroxy) quinoline aluminum (Alq) emitter and an electron injection layer. Dye-doping of PVK with DCM induced a red shift of the spectrum due to concomitant emission from Alq and DCM. Some devices were passivated with Si3N4 deposited by RF sputtering. In that latter case, the threshold voltage of the LED slightly increased, but the emitted power was kept constant. The LED surface was imaged with a lateral resolution as low as 30 mu mm using Scanning ElectroLuminescence Imaging Microscopy (SELIM), a technique derived from the well-known Scanning Photo-Luminescence (SPL) widely used for III-V and II-VI semiconductors. This technique was successfully used to assess the lateral homogeneity of the emitting surface, and the aging of the diodes. At increasing working time, the devices did not show dark spots formation but a uniform decrease of the luminescence. (C) 1999 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:261 / 266
页数:6
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