Properties of electrochromic nickel-vanadium oxide films sputterdeposited from non-magnetic alloy target

被引：10

作者：

Avendaño, E ^{[1
]}

Azens, A ^{[1
]}

Niklasson, G ^{[1
]}

机构：

[1] Uppsala Univ, Angstrom Lab, Dept Mat Sci, Div Solid State Phys, SE-75121 Uppsala, Sweden

来源：

SOLAR AND SWITCHING MATERIALS | 2001年 / 4458卷

关键词：

nickel-vanadium oxide; DC reactive sputtering; thin films; electrochromic;

D O I：

10.1117/12.448243

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

In this study we investigate the structure, composition, diffusion coefficient, and electrochromic properties of nickel-vanadium oxide films as a function of deposition conditions. Polycrystalline films have been deposited by DC magnetron sputtering from a nonmagnetic target of Ni0.93V0.07 in an atmosphere Of O-2/Ar and Ar/O-2/H-2, with the gas flow ratios varied systematically to cover the range from nearly-metallic to overoxidized films. The results contradict the usual view that films deposited in O-2/Ar are dark brown in their as-deposited state. While such films can easily be deposited, the optimum electrochromic properties have been observed at O-2/Ar ratios giving nearly transparent films. Addition of hydrogen to the sputtering atmosphere improved cycling stability of the films. The diffusion coefficient has been determined by the Galvanostatic Intermittent Titration Technique (GITT).

引用

页码：154 / 163

页数：10

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