Experimental studies on elementary kinetics in N2-O2 pulsed discharges

In this paper we discuss 'early afterglow' studies on elementary kinetics in a pulsed rf discharge in N-2 and N-2-O-2 mixtures. In particular we review the following topics: (a) LIF measurements of N-2(A (3)Sigma(u)(+)) density and upsilon = 0-9 vibrational distribution; (b) measurement of N-2(A (3)Sigma(u)(+), upsilon = 2-7) quenching rate constants by O-2, O and NO; (c) study of the NO(A (2)Sigma(+)) excitation; (d) N-2(B (3)Pi(g)) vibrational distribution measurement and analysis of its excitation processes by means of a kinetic model. New results are moreover presented and discussed: (e) two-photon LIF (TALIF) measurements of O-atom density and loss rate; (f) LIF measurements of NO density.