Growth of nitrogen stabilised cubic ZrO2 phase by reactive magnetron sputtering using two reactive gases

被引:14
作者
Collard, S [1 ]
Kupfer, H [1 ]
Hoyer, W [1 ]
Hecht, G [1 ]
机构
[1] Tech Univ Chemnitz, Dept Phys, D-09107 Chemnitz, Germany
关键词
D O I
10.1016/S0042-207X(99)00142-6
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In this work the use of magnetron sputtering with two reactive gases is presented. Oxygen and nitrogen gases are simultaneously employed in order to grow oxynitride coatings. It has been shown that the deposition method is suitable in order to deposit a new phase. This new phase is characterised by electron probe microanalysis and X-ray diffraction. The combination of Bragg-Brentano scans and pole figure measurements allows to determine the structure of the phase. The phase transitions depend on the rate of the oxygen and nitrogen flows. ZrN-based films are deposited for slow rate oxygen flows. The use of intermediate rates of oxygen flows lead to the formation of a new phase. This phase has a similar structure as the stabilised cubic ZrO2 one. The films deposited with a higher rate of oxygen flow form the monoclinic ZrO2 phase. (C) 1999 Elsevier Science Ltd. All rights reserved.
引用
收藏
页码:153 / 157
页数:5
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