Preparation and optical transmittance of titanium hydride (deuteride) films by rf reactive sputtering

被引：7

作者：

Nakao, S ^{[1
]}

Saitoh, K ^{[1
]}

Hirahara, T ^{[1
]}

Ikeyama, M ^{[1
]}

Tazawa, M ^{[1
]}

Jin, P ^{[1
]}

Niwa, H ^{[1
]}

Tanemura, S ^{[1
]}

Miyagawa, Y ^{[1
]}

Miyagawa, S ^{[1
]}

Yasuda, K ^{[1
]}

机构：

[1] Natl Ind Res Inst Nagoya, Kita Ku, Nagoya, Aichi 4628510, Japan

来源：

THIN SOLID FILMS | 1999年 / 343卷

关键词：

titanium hydride films; titanium deutride films; rf reactive sputtering; optical transmittance; X-ray diffraction; elastic recoil detection analysis spectra; Rutherford backscattering spectrometry; scanning electron microscopy micrographs;

D O I：

10.1016/S0040-6090(98)01604-6

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Microstructure of the titanium hydride (deuteride) films prepared by rf reactive sputtering with Ar and H(2) (or D(2)) gases were examined by X-ray diffraction measurements, scanning electron microscopy, Rutherford backscattering spectrometry and elastic recoil detection analysis. In addition, their optical measurements were also carried out in visible and infra-red regions. It was found that the hcp Ti structure (alpha-TiH(x)) was mainly formed at high rf power. With decreasing rf power, however, the fee CaF(2) structure (delta-TiH(x)) was obtained. The films have a smooth surface at a short time of deposition for 1-10 min, and these films are used for optical measurements. The films show wide absorption over visible and infra-red regional although the films include a large amount of O atoms, which may suggest the presence of the amorphous titanium oxide phase. (C) 1999 Elsevier Science S.A. All rights reserved.

引用

页码：195 / 198

页数：4

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