Effect of 10 MPa ammonia treatment on the activity of visible light responsive Ta3N5 photocatalyst

被引：46

作者：

Lee, Yungi

Nukumizu, Kota

Watanabe, Tomoaki

Takata, Tsuyoshi

Hara, Michikazu

Yoshimura, Masahiro

Domen, Kazunari

机构：

[1] Univ Tokyo, Dept Chem Syst Engn, Bunkyo Ku, Tokyo 1138656, Japan

[2] Tokyo Inst Technol, Chem Resources Lab, Midori Ku, Yokohama, Kanagawa 2268503, Japan

[3] Tokyo Inst Technol, Mat & Struct Lab, Midori Ku, Yokohama, Kanagawa 2268503, Japan

[4] SORST, JST, Taito Ku, Tokyo 1100015, Japan

来源：

CHEMISTRY LETTERS | 2006年 / 35卷 / 04期

关键词：

D O I：

10.1246/cl.2006.352

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

The photocatalytic activity of tantalum nitride (Ta3N5) for H-2 evolution under visible-light irradiation (lambda > 420nm) is improved fivefold by 10 MPa ammonia treatment at 823 K. The rate of H-2 evolution of the treated samples is highly related to the treatment time and treatment temperature.

引用

页码：352 / 353

页数：2

共 7 条

[1] Conduction and valence band positions of Ta2O5, TaON, and Ta3N5 by UPS and electrochemical methods [J].