Catalysis in the nm-regime:: manufacturing of supported model catalysts and theoretical studies of the reaction kinetics

被引：28

作者：

Kasemo, B ^{[1
]}

Johansson, S

Persson, H

Thormählen, P

Zhdanov, VP

机构：

[1] Chalmers Univ Technol, Competence Ctr Catalysis, SE-41296 Gothenburg, Sweden

[2] Chalmers Univ Technol, Dept Appl Phys, SE-41296 Gothenburg, Sweden

[3] Russian Acad Sci, Boreskov Inst Catalysis, Novosibirsk 630090, Russia

来源：

TOPICS IN CATALYSIS | 2000年 / 13卷 / 1-2期

关键词：

wetness impregnation; vacuum vapor deposition; electron-beam lithography; spin-coating technique; vesicle-mediated deposition; Monte Carlo simulations; models of surface chemical reactions;

D O I：

10.1023/A:1009024603803

中图分类号：

O69 [应用化学];

学科分类号：

081704 ;

摘要：

We briefly review the methods employed to fabricate model supported nm catalysts, including wetness impregnation, vacuum vapor deposition, electron-beam lithography, spin-coating, and vesicle-mediated deposition. Recent simulations of the kinetics of heterogeneous reactions occurring on supported catalyst particles are discussed as well. The attention is focused on such effects as reactant supply via the support, interplay of the reaction kinetics on different facets and edges, and adsorbate-induced reshaping of catalyst particles.

引用

页码：43 / 53

页数：11

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